Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

Nanoimprint lithography presents unique opportunities for patterned media applications due to its advantages of sub-10nm resolution capability, patterning of a whole disk in a single imprint step with reasonably high throughput, and the relatively low capital cost in comparison to other next generation lithography technologies. However, there are several critical issues that still remain very challenging. This article will briefly discuss these...