A Simple Dual-Ion Doping Method for Stabilizing Li-Rich Materials and Suppressing Voltage Decay

Volume: 12, Issue: 12, Pages: 13996 - 14004
Published: Mar 9, 2020
Abstract
A gentle method is used to treat the precursor to induce the doping of SO42- and Ni2+. The doped SO42- induces the formation of oxygen vacancies and defects, which are beneficial for inhibition of the loss of O2-, stabilization of the structure, and amelioration of voltage decay, and the doped Ni2+ increases the degree of lithium nickel mixing and significantly increases the midvoltage. After modification, the specific discharge capacity reaches...
Paper Details
Title
A Simple Dual-Ion Doping Method for Stabilizing Li-Rich Materials and Suppressing Voltage Decay
Published Date
Mar 9, 2020
Volume
12
Issue
12
Pages
13996 - 14004
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