Vapor growth of diamond on diamond and other surfaces

Volume: 52, Pages: 219 - 226
Published: Apr 1, 1981
Abstract
It is shown that diamond crystallization by chemical vapor deposition should preferably be carried out at reduced pressures. Selective growth of diamond is ensured by introducing atomic hydrogen into the crystallization zone; this suppresses crystallization of graphite. The growth rate of homoepitaxial diamond films reached 1 μm/h at 1000°C; film properties were identical to those of bulk crystals. The lattice parameter in boron-doped films...
Paper Details
Title
Vapor growth of diamond on diamond and other surfaces
Published Date
Apr 1, 1981
Volume
52
Pages
219 - 226
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