The VIISion 80 and VIISion 200 ion implanter beam lines

The beam line design for Varian's VIISion high current ion implanters incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass...