Investigating the plasma parameters and discharge asymmetry in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

Dual magnetron reactive high power impulse magnetron sputtering (dual magnetron R-HiPIMS) provides a deposition process favor for low temperature crystallization of high quality dielectric films. However, lack of detailed measurements is blocking the accurate understanding of the resulting film quality to the plasma parameters. In this work, a dual magnetron R-HiPIMS discharge with Al in a fixed Ar/O2 mixture has been investigated by means of...