N/S dual-doped graphene with high defect density for enhanced supercapacitor properties

Volume: 45, Issue: 1, Pages: 112 - 122
Published: Jan 1, 2020
Abstract
N/S dual-doped graphene was prepared by one-pot process using graphene oxide as raw material and thiourea and urea as reduction-dopants. The field emission scanning electron microscopy (FESEM), X-ray powder diffraction (XRD), Raman spectroscopy (Raman), nuclear magnetic resonance (NMR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and other means were used to characterize the microstructure and morphology of the samples. The...
Paper Details
Title
N/S dual-doped graphene with high defect density for enhanced supercapacitor properties
Published Date
Jan 1, 2020
Volume
45
Issue
1
Pages
112 - 122
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