Development and evaluation of a chemical kinetics reaction mechanism for tetramethylsilane-doped flames

Volume: 209, Pages: 115209 - 115209
Published: Dec 1, 2019
Abstract
Tetramethysilane (TMS) is a precursor for flame synthesis of silica (SiO2) nanoparticles. A chemical reaction mechanism was developed for the oxidation of TMS in a lean low-pressure (p ≈ 30 mbar) H2/O2/Ar flame using species mole fractions, obtained from molecular-beam mass spectrometry (MBMS) measurements in a matrix-supported flat flame doped with 600 ppm TMS. The thermodynamic data of Si-containing species were determined from...
Paper Details
Title
Development and evaluation of a chemical kinetics reaction mechanism for tetramethylsilane-doped flames
Published Date
Dec 1, 2019
Volume
209
Pages
115209 - 115209
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