Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*

Volume: 16, Issue: 7
Published: Apr 12, 2019
Abstract
The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy-deficient and monomer-deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy. The data is also...
Paper Details
Title
Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*
Published Date
Apr 12, 2019
Volume
16
Issue
7
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