Selective Oxidation and Carbonization by Laser Writing into Porous Silicon

The selective formation of either oxidized or carbonized features into 2.5 µm thick porous silicon (PS) films using laser writing at a wavelength of 405 nm is demonstrated. Oxidized features are formed in air while carbonized features are achieved during the flow of propane at 600 sccm. Voids which have been previously associated with the use of propane are not observed, largely due to the rapid heating and high flow rates achieved in the...