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Investigation of wall chemical effect using PLIF measurement of OH radical generated by pulsed electric discharge

Published on Oct 1, 2018in Combustion and Flame4.12
· DOI :10.1016/j.combustflame.2018.06.005
Yong Fan5
Estimated H-index: 5
(UTokyo: University of Tokyo),
Weirong Lin1
Estimated H-index: 1
(UTokyo: University of Tokyo)
+ 1 AuthorsYuji Suzuki31
Estimated H-index: 31
(UTokyo: University of Tokyo)
Abstract
Abstract Near-wall distribution of OH radical concentration provides a measure of the wall chemical effect near a solid surface. However, it is not a straightforward process to isolate the wall chemical effect from the effect of gas-phase reactions because the OH radical distribution can be influenced by both the wall chemical effect and the effect of heat and radicals released by gas-phase reactions. In the present study, instead of the flame, OH radicals generated by a pulsed electric discharge is used in order to eliminate the interference from the gas-phase reaction. OH field with comparable concentration to a methane/air premixed flame has been achieved by tuning the input electric power of pulsed electric discharge. The wall chemical effect is investigated by comparing OH distributions near the quartz wall and the quartz wall with 100-nm-thick alumina coating, while the wall thermal boundary condition is kept identical. High-resolution near-wall measurement of OH distribution was carried out by microscopic planar laser-induced fluorescence (PLIF), and the result was analyzed with the aid of numerical simulations with a surface reaction mechanism. It is found that the initial sticking coefficients estimated on the quartz/alumina surfaces are almost the same with the results in our previous methane/air flame experiment (Saiki and Suzuki, 2013). In the present OH field with electric discharge, it is easier to investigate the radical quenching effect, as the wall chemical effect on OH is decoupled from the gas-phase reaction. The chemical action defined as the wall-normal OH concentration gradient divided by the local OH concentration, which is an index of the wall chemical effect, increases with increasing wall temperature in the OH field generated by pulsed electric discharge.
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  • Citations (1)
References20
Newest
#1Yu Saiki (Nagoya Institute of Technology)H-Index: 5
#2Yong Fan (UTokyo: University of Tokyo)H-Index: 5
Last.Yuji Suzuki (UTokyo: University of Tokyo)H-Index: 31
view all 3 authors...
11 CitationsSource
#1Andreas Dreizler (Technische Universität Darmstadt)H-Index: 38
#2Benjamin Böhm (Technische Universität Darmstadt)H-Index: 21
49 CitationsSource
#1Andrey Starikovskii (Princeton University)H-Index: 17
#2Nickolay Aleksandrov (MIPT: Moscow Institute of Physics and Technology)H-Index: 22
350 CitationsSource
#1Yu Saiki (Nagoya Institute of Technology)H-Index: 5
#2Yuji Suzuki (UTokyo: University of Tokyo)H-Index: 31
42 CitationsSource
#1Yu Saiki (UTokyo: University of Tokyo)H-Index: 5
#2Naoki Kurimoto (UTokyo: University of Tokyo)H-Index: 4
Last.Nobuhide Kasagi (UTokyo: University of Tokyo)H-Index: 34
view all 4 authors...
10 CitationsSource
#1Yong Fan (UTokyo: University of Tokyo)H-Index: 5
#2Yuji Suzuki (UTokyo: University of Tokyo)H-Index: 31
Last.Nobuhide Kasagi (UTokyo: University of Tokyo)H-Index: 34
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23 CitationsSource
#1Yong Fan (UTokyo: University of Tokyo)H-Index: 5
#2Yuji Suzuki (UTokyo: University of Tokyo)H-Index: 31
Last.Nobuhide Kasagi (UTokyo: University of Tokyo)H-Index: 34
view all 3 authors...
53 CitationsSource
#1Kyu Tae Kim (KAIST)H-Index: 4
#2Dae Hoon LeeH-Index: 14
Last.Sejin Kwon (KAIST)H-Index: 23
view all 3 authors...
73 CitationsSource
#1Shaurya Prakash (UIUC: University of Illinois at Urbana–Champaign)H-Index: 14
#2Nick G Glumac (UIUC: University of Illinois at Urbana–Champaign)H-Index: 28
Last.Mark A. Shannon (UIUC: University of Illinois at Urbana–Champaign)H-Index: 36
view all 4 authors...
22 CitationsSource
#1Craig M. Miesse (UIUC: University of Illinois at Urbana–Champaign)H-Index: 3
#2Richard I. Masel (UIUC: University of Illinois at Urbana–Champaign)H-Index: 46
Last.Mark Short (UIUC: University of Illinois at Urbana–Champaign)H-Index: 19
view all 5 authors...
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#2K.D. Kunkuma A. Somarathne (Tohoku University)H-Index: 4
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view all 10 authors...
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