Silicon-film-related random telegraph noise in UTBOX silicon-on-insulator nMOSFETs

Volume: 36, Issue: 9, Pages: 094005 - 094005
Published: Sep 1, 2015
Abstract
This paper studies the amplitude of random telegraph noise (RTN) caused by a single trap in the silicon film of ultra-thin buried oxide (UTBOX) silicon-on-insulator (SOI) devices. The film-defect-related RTN was identified and analyzed by low frequency noise measurement and time domain measurement. Emphasis is on the relative amplitude ΔID/ID, which is studied in the function of the front-gate, the back-gate and the drain-to-source biases....
Paper Details
Title
Silicon-film-related random telegraph noise in UTBOX silicon-on-insulator nMOSFETs
Published Date
Sep 1, 2015
Volume
36
Issue
9
Pages
094005 - 094005
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