Achieving clean epitaxial graphene surfaces suitable for device applications by improved lithographic process

Volume: 104, Issue: 22, Pages: 224102 - 224102
Published: Jun 2, 2014
Abstract
It is well-known that the performance of graphene electronic devices is often limited by extrinsic scattering related to resist residue from transfer, lithography, and other processes. Here, we report a polymer-assisted fabrication procedure that produces a clean graphene surface following device fabrication by a standard lithography process. The effectiveness of this improved lithography process is demonstrated by examining the temperature...
Paper Details
Title
Achieving clean epitaxial graphene surfaces suitable for device applications by improved lithographic process
Published Date
Jun 2, 2014
Volume
104
Issue
22
Pages
224102 - 224102
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