Chloroplast avoidance movement reduces photodamage in plants

Nature64.80
Volume: 420, Issue: 6917, Pages: 829 - 832
Published: Dec 1, 2002
Abstract
When plants are exposed to light levels higher than those required for photosynthesis, reactive oxygen species are generated in the chloroplasts and cause photodamage. This can occur even under natural growth conditions. To mitigate photodamage, plants have developed several protective mechanisms. One is chloroplast avoidance movement, in which chloroplasts move from the cell surface to the side walls of cells under high light conditions,...
Paper Details
Title
Chloroplast avoidance movement reduces photodamage in plants
Published Date
Dec 1, 2002
Journal
Volume
420
Issue
6917
Pages
829 - 832
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