Impact of Thermal Oxidation on the Adsorptive Properties and Structure of Porous Silicon Particles
Volume: 112, Issue: 26, Pages: 9717 - 9722
Published: Jun 11, 2008
Abstract
A combination of gas and probe molecule adsorption from aqueous solution have been applied to determine the adsorptive and structural properties of porous silicon (pSi) particles as a function of thermal oxidation in the range 473−1073 K. Gaseous nitrogen adsorption has shown a decrease in the BET specific surface area, mesopore volume, and diameter due to the increasing molecular volume of the oxidized silicon layer within the pores. Methylene...
Paper Details
Title
Impact of Thermal Oxidation on the Adsorptive Properties and Structure of Porous Silicon Particles
Published Date
Jun 11, 2008
Volume
112
Issue
26
Pages
9717 - 9722
Citation AnalysisPro
You’ll need to upgrade your plan to Pro
Looking to understand the true influence of a researcher’s work across journals & affiliations?
- Scinapse’s Top 10 Citation Journals & Affiliations graph reveals the quality and authenticity of citations received by a paper.
- Discover whether citations have been inflated due to self-citations, or if citations include institutional bias.
Notes
History