Original paper

Development of 3.3 kV SiC-MOSFET: Suppression of Forward Voltage Degradation of the Body Diode

Volume: 778-780, Pages: 951 - 954
Published: Feb 1, 2014
Abstract
In order to achieve cost reduction or shrinkage of power devices, an internal body diode, which forms in a MOSFET parasitically, can be designed as a free-wheeling diode in substitution for an external Schottky barrier diode (SBD). However, in a SiC p-i-n diode, forward current stress causes reliability degradation due to expansion of the electron-hole recombination-induced stacking faults. Applying the process optimization of the epitaxial...
Paper Details
Title
Development of 3.3 kV SiC-MOSFET: Suppression of Forward Voltage Degradation of the Body Diode
Published Date
Feb 1, 2014
Volume
778-780
Pages
951 - 954
Citation AnalysisPro
  • Scinapse’s Top 10 Citation Journals & Affiliations graph reveals the quality and authenticity of citations received by a paper.
  • Discover whether citations have been inflated due to self-citations, or if citations include institutional bias.