Towards single‐trap spectroscopy: Generation‐recombination noise in UTBOX SOI nMOSFETs

An overview is given on the possibilities of using generation‐recombination (GR) noise as a tool for defect spectroscopy in semiconductor materials and devices. The method is illustrated by n‐channel MOSFETs fabricated on silicon‐on‐insulator (SOI) substrates with an ultra‐thin buried oxide (UTBOX). As will be shown, the use of fully depleted (FD) UTBOX devices offers some unique opportunities and challenges. In the first instance, one can apply...